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  • christopher prindle at www.freescale.com
    CVD TiSiN Diffusion Barrier Integration in Sub-130 nm . - Freescale
    (512) 933-3491, FAX (512) 933-6438, [email protected] Abstract. Metalorganic chemical vapor deposition (MOCVD) titanium silicon nitride .
  • christopher prindle at s3.ptodirect.com
    (12) United States Patent (10) Patent N0.: US 7601641 B1 - PTO Direct
    13 Oct 2009 . Christopher Prindle, Poughkeepsie, NY * Cited by examiner. (US); Sven Beyer, Dresden (DE) _. _ _ Primary ExamineriN DreW Rlchards.
  • christopher prindle at ieeexplore.ieee.org
    Impact of both metal composition and oxygen/nitrogen . - IEEE Xplore
    25 Jan 2013 . Pavel Potapov, Christopher Prindle, Dina H. Triyoso, and Andy Wei. GLOBALFOUNDRIES, Wilschdorfer Landstraße 101, 01109 Dresden, .

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