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  • alexander gschwandtner at www.scientific.net
    Full Text Pdf - Scientific.net
    [email protected], [email protected] Keywords: ALD, Al2O3, TMA, batch processing. Abstract. Scaling of CMOS structures .
  • alexander gschwandtner at cordis.europa.eu
    Print to PDF - CORDIS - Europa
    9 Sep 2014 . Administrative contact: Alexander Gschwandtner. Tel.: +49 1728338658. Fax: +49 7348 204928. E-mail. HQ-Dielectrics GmbH. Germany.
  • alexander gschwandtner at ieeexplore.ieee.org
    Through-the-gate-implanted ultrathin gate oxide . - IEEE Xplore
    Udo Schwalke, Alexander Gschwandtner, Gudrun Innertsberger, and Martin Kerber. Abstract—We have realized direct-tunneling (DT) gate oxide. (1.6 nm) .
  • alexander gschwandtner at cordis.europa.eu
    Print to PDF - CORDIS - Europa
    5 Aug 1996 . Administrative contact: Alexander GSCHWANDTNER. Tel.: +49-89-63645067. Fax: +49-89-63644236. Siemens Ag, Semiconductor Group.
  • alexander gschwandtner at patentimages.storage.googleapis.com
    Method of producing a semiconductor surface covered with fluorine
    27 Sep 2000 . SEMICONDUCTOR SURFACE COVERED. WITH FLUORINE. (75) Inventors: Alexander Gschwandtner, Miinchen. (DE); Gudrun Innertsberger,.

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